Daniel L. Frank, Ryan Kurtz, Nicholas A. Tinsley, Aaron J. Gassmann, Lance J. Meinke, Daniel Moellenbeck, Michael E. Gray, Larry W. Bledsoe, Christian H. Krupke, Ronald E. Estes, Patrick Weber, Bruce E. Hibbard
Journal of Economic Entomology 108 (3), 1260-1270, (1 June 2015) https://doi.org/10.1093/jee/tov081
KEYWORDS: Diabrotica virgifera virgifera, Diabrotica barberi, refuge-in-a-bag, MIR604, 5307, insect resistance management, seed mix refuge
Seed blends containing various ratios of transgenic Bt maize (Zea mays L.) expressing the mCry3A eCry3.1Ab proteins and non-Bt maize (near-isoline maize) were deployed alone and in combination with a soil applied pyrethroid insecticide (Force CS) to evaluate the emergence of the western corn rootworm, Diabrotica virgifera virgifera LeConte, in a total of nine field environments across the Midwestern United States in 2010 and 2011. Northern corn rootworm, Diabrotica barberi Smith & Lawrence emergence was also evaluated in four of these environments. Both western and northern corn rootworm beetle emergence from all Bt treatments was significantly reduced when compared with beetle emergence from near-isoline treatments. Averaged across all environments, western corn rootworm beetle emergence from 95:5, 90:10, and 80:20 seed blend ratios of mCry3A eCry3.1Ab: near-isoline were 2.6-, 4.2-, and 6.7-fold greater than that from the 100:0 ratio treatment. Northern corn rootworm emergence from the same seed blend treatments resulted in 2.8-, 3.2-, and 4.2-fold more beetles than from the 100:0 treatment. The addition of Force CS (tefluthrin) significantly reduced western corn rootworm beetle emergence for each of the three treatments to which it was applied. Force CS also significantly delayed the number of days to 50% beetle emergence in western corn rootworms. Time to 50% beetle emergence in the 100% mCry3A eCry3.1Ab treatment with Force CS was delayed 13.7 d when compared with western corn rootworm beetle emergence on near-isoline corn. These data are discussed in terms of rootworm resistance management.