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4 April 2012 Effect of Low-Energy Electron Irradiation on DNA Damage by Fe3 Ion
Yeunsoo Park, Hyung Ah Noh, Hyuck Cho
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Abstract

We investigated the combined effects of low-energy electron irradiation and Fe3 ion on DNA damage. We used lyophilized pBR322 plasmid DNA films with various concentrations (0 ∼ 7 mM) of Fe3 ions and irradiation with monochromatic, low-energy 3 or 5 eV electrons for these studies. DNA-Fe3 films were recovered and analyzed by agarose gel electrophoresis to identify and compare the effects of Fe3 ions and/or low-energy electrons alone or in combination on DNA damage. In nonirradiated DNA-Fe3 films, there was little DNA damage observed (less than 10% of the total DNA loaded on the gel appeared damaged) for Fe3 ion up to 7 mM concentration. In irradiated DNA films without Fe3 ions, there was also very little DNA damage observed (less than 3% of the total DNA loaded on the gel appeared damaged). However, when DNA-Fe3 films, were irradiated with low-energy electrons, DNA damage was significantly increased compared to the sum of the damage caused both by either Fe3 ion or low-energy electrons irradiation alone. We proposed that both DEA and/or electron transfer processes might play a role in the enhanced DNA damage when DNA-Fe3 films were irradiated by low-energy electrons.

Yeunsoo Park, Hyung Ah Noh, and Hyuck Cho "Effect of Low-Energy Electron Irradiation on DNA Damage by Fe3 Ion," Radiation Research 177(6), 775-780, (4 April 2012). https://doi.org/10.1667/RR2844.1
Received: 28 October 2011; Accepted: 1 January 2012; Published: 4 April 2012
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